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Cabot Microelectronics Corporation

ccmp · NASDAQ Technology
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Sector Technology
Industry Semiconductors
Employees 1001-5000
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FY2004 Annual Report · Cabot Microelectronics Corporation
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2 0 0 4   A n n u a l

  R e p o r t

Shaping the Surface of Tomorrow

History of Profitable Growth
History of Profitable Growth
Cabot Microelectronics has demonstrated a history of
Cabot Microelectronics has demonstrated a history of
strong profitable growth, having delivered tens of 
strong profitable growth, having delivered tens of 
millions of gallons of high performance CMP slurries
millions of gallons of high performance CMP slurries
to our customers worldwide.
to our customers worldwide.

FINANCIAL HIGHLIGHTS

350

300

250

200

150

100

50

0

$309.4

$251.7

$227.2 $235.2

$181.2

2000

2001

2002

2003 2004

REVENUE, $ million

$

350

300

250

200

150

100

50

0

175

140

105

70

35

0

2.0

1.5

1.0

0.5

0.0

2000

2001

2002

2003 2004

2000

2001

2002

2003 2004

2000

2001

2002

2003 2004

$309.4

$251.7

$227.2 $235.2

$181.2

350

300

250

200

150

100

50

0

175

140

105

L HIGHLIGHTS

70

35

$180.6

(Amounts in millions, except for EPS and ROIC) 
2000
SELECTED INCOME STATEMENT DATA:

FY

0

2001

2002
2004

2003 2004

2003

Increase

Revenue
Operating Income
Net Income
Diluted Earnings Per Share (EPS)
Total Assets
Stockholders’ Equity
Cash Balance
After Tax Return On Invested Capital (ROIC)

$309.4
$69.7
$46.7
$1.88
$363.3
$315.6
$157.3
27%

$251.7
$56.1
$37.7
$1.53
$315.6
$271.8
$111.3
24%

23%
24%
24%
23%
15%
16%
41%
17%

2.00

1.50

$1.39

$1.88

$1.72

$1.66

$1.53

1.00

0.50

0.00

2000

2001

2002

2003 2004

2000

2001

2002

2003 2004

EARNINGS PER SHARE, $ 

Cabot Microelectronics Corporation

of polishing slurries used in a

is  the  world’s  leading  supplier 

process called Chemical Mechanical

Planarization, or CMP, to polish various

materials used in semiconductor manufacturing

processes. Our products play a critical role in

the production of the most advanced semi-

conductor devices, enabling the manufacture

of smaller, faster and more complex devices

by our customers.

Customers use our CMP solutions to 

polish advanced multi-layered integrated 

circuits  (IC’s)  and  data  storage  components

to a planar, defect-free finish. As the pioneer

and leader in the CMP slurry arena, our

products enable customers to produce 

high-performance memory, logic and data

storage devices with higher product yields,

improved product performance, increased

manufacturing throughput, and lower overall

production costs.  

2

0

0

4

A n

n u a l

  R e

p o

r

t

EVOLVING WITH A GROWING 
AND CHANGING INDUSTRY

Consumers worldwide continue to demand products that are

wireless and digital devices has resulted in rising global semi-

faster, smaller and more complex. The proliferation of electronic

conductor demand and functionality. We believe these trends will increase

the demand for CMP to enable the production of smaller, faster and better

functioning semiconductor devices.

OPERATIONS EXCELLENCE 

Our  focus  on  operations  excellence,  including  our
recent company-wide implementation of Six Sigma,
will enable us to continue to meet the ever higher
quality, consistency and yield requirements of our
customers, while also allowing us to improve our
productivity and help identify opportunities for 
cost improvement.  

TECHNOLOGY LEADERSHIP

Through close partnerships
with our customers, our team
of world-class scientists and
engineers is able to develop
the  customized  solutions
r e q u i r e d   t o   a d d r e s s o u r  
customers’ needs for next
generation technologies. Our strong balance
sheet enables a commitment to R & D investment
that we believe is unrivaled in our industry. We
believe we are the only company today that is able
to offer solutions for all CMP applications and 
technology nodes.

GETTING CLOSER TO 
OUR CUSTOMERS

We are strengthening our relationships
with  customers  through  our  global
sales, service and technical teams. By
locating sales and technical support
around  the  world,  we  are  able  to  more
closely and effectively collaborate with
our customers globally. 

EXPANSION IN ASIA 

As semiconductor production and technology continue to grow
and shift toward Asia, we are expanding our already strong
presence  and  brand.  We  are  adding
additional  production  capacity to  our
largest  volume  manufacturing plant,
located in Geino, Japan. In 2005, we
plan to open a new Asia Pacific
Technology Center to develop new
products and solutions for our 
customers worldwide.

PAGE 1

 
TO OUR SHAREHOLDERS, CUSTOMERS AND EMPLOYEES:

Upon completion of my first year as CEO of Cabot Microelectronics Corporation, I can say to you with enthusiasm that I am proud of what has been a very
successful year for our company. Our accomplishments over the past year are notable, yet I believe the important changes we have made throughout our
organization to position us for continued success in the future are of even greater significance. As we continue to operate within a dynamic environment 
for our company and for our customers, I would like to address the key aspects of our business that form the foundation for our strategy for 
success going forward. 

CONTINUED STRONG FINANCIAL PERFORMANCE   
We are proud of our financial performance in fiscal 2004, which we believe demonstrates the continued financial strength and stability of our company.
We achieved another record level of revenue, at $309 million, growing revenue by 23 percent compared to fiscal 2003, while maintaining a healthy gross
profit margin of 49 percent of revenue. We also posted a record level of earnings per share at $1.88, reversing two prior years of decreasing earnings per
share. We achieved these results through the hard work and dedication of our 585 employees worldwide, aided by the recovery of the semiconductor
industry. We believe our financial results and solid balance sheet provide us with the flexibility to meet future opportunities and challenges.

OUR LEADERSHIP TEAM FOR THE FUTURE
To facilitate more effective execution of our strategies, this year I made a number of additions and changes to our executive leadership team. I am 
delighted with the leadership and fresh perspectives that our new leaders in Research and Development, Operations, Human Resources, Corporate
Development, Quality and Asia Pacific have brought to our company. In conjunction with this realignment at the leadership level, we are also cultivating
more disciplined approaches and processes within our business to capture quality and efficiency improvements, to become more innovative, to drive 
broad organizational development across our company, and to increase our overall leadership capability. These improvements have already begun to 
pay off for our company, and I am confident that they will continue to do so in the future.

THREE KEY STRATEGIES
Throughout the year we continued our execution of three key strategies – maintaining our technology leadership, achieving operations excellence, and 
getting closer to customers – which together continue to serve as the engine that drives our opportunities for future success.

TECHNOLOGY LEADERSHIP – Our customers’ relentless pursuit of ever greater performance and lower costs is increasing the complexity of CMP technology,
which is leading to a fragmentation of technical solutions and greater customization of products by customer, tool set and process integration approach.
This customization represents a new dynamic in the industry and creates a unique opportunity for Cabot Microelectronics as the technology leader in CMP
slurries. The capabilities and scale within our technology organization, which we believe are greater than any of our competitors, allow us to flexibly deploy
our technical resources to provide more customer specific technical solutions on a cost-effective basis in partnership with our customers.

Our historical focus in research and development has been on innovating to achieve ever greater product performance. While we will continue this 
orientation, we are now also focusing on innovating to reduce the cost of ownership of our products to respond to customer needs for lower cost solutions.

Within our technology team, we reorganized and refocused our efforts toward achieving excellence in three areas - robust development of new products
for specific existing and emerging applications, process development to support rapid and effective commercialization of new products, and development
of fundamental enabling technology to provide new CMP technology platforms for future generation products. We have also broadly implemented a Six
Sigma initiative across the company that is bringing new focus on more disciplined and systematic methods of experimental design and data analysis.
Our three-pronged approach to research and development, combined with our Six Sigma initiative, provides competitive strength that we are leveraging
as we meet the needs of our customers. 

OPERATIONS EXCELLENCE – As IC technology has advanced, semiconductor manufacturers’ processes have become highly sensitive to CMP slurries and
slurry performance, and customers now demand absolute consistency in slurry products, gallon to gallon, drum to drum, and lot to lot, across thousands of
gallons of product. Further, in many cases product purity requirements are now measured at the “parts per billion” level, and we are finding that product
quality and consistency have often become as important to our customers as ultimate product performance. This industry trend toward greater product 
quality and consistency demands ever-increasing manufacturing capabilities from us, as well as from our suppliers.

We are unique among CMP slurry providers by virtue of our established record of successfully delivering tens of millions of gallons of slurry to our 
customers on time and within specification. We believe we have the largest global manufacturing network for CMP slurries in the industry, producing 
products in five manufacturing facilities on three continents, which affords us access to efficiencies and economies of scale that we believe our 
competitors do not have. We have a very sophisticated quality process in our manufacturing operations, and an accompanying equally sophisticated 
supplier quality process, that have enabled us to meet the increasingly stringent requirements of our customers.

In further pursuit of operations excellence, implementation of our Six Sigma initiative is illuminating new and intriguing opportunities to further improve
the quality of our products and services, and to capture productivity and efficiency gains. It has been energizing to see how fast this process has taken
hold within our organization. 

GETTING CLOSER TO CUSTOMERS – Over the last year we have focused a great deal of effort on building deeper and richer relationships with our 
customers around the world at multiple organizational levels. These efforts have involved some significant changes in the operating culture of our 
company. We have shown our customers a greater willingness to listen and respond to their requests, and to work collaboratively with them. We have 
made the customer the center of our programs and initiatives. Our actions and efforts in this area have prompted very supportive and complimentary
feedback from our customers. Our goal is to achieve ever higher levels of trust and loyalty from all of our customers as we work together to develop 
the materials and process technologies for the future. Although we are pleased with our progress in this area, we are far from satisfied and we intend
to continue to pursue this initiative relentlessly.

PAGE 2

UNDERSTANDING CMP 

Semiconductor chips are the basic building
blocks of electronic devices. The first layer of 
a chip consists of millions of microscopic 
transistors that are interconnected in 
subsequent layers with microscopic wires. The
smallest wires are 65 nanometers (or
0.0000065 centimeters) across – over 1,000
times  thinner  than  a  human  hair.  Each  layer
must be polished to maintain the structural and
electrical integrity of the device. CMP, or 
chemical mechanical planarization, is a 
polishing process used by semiconductor 
manufacturers to planarize or flatten the 
multiple layers of material that are built upon
silicon wafers in the production of advanced
integrated circuits. CMP slurries are liquid 
formulations that enable this polishing process
and generally contain engineered abrasives,
high purity deionized water, and proprietary
chemical additives.

EXPANSION IN THE ASIA PACIFIC REGION 
A clear trend within the semiconductor industry is the ongoing shift of industry activity to the Asia
Pacific region. Although North America is still a key region for the global semiconductor industry,
most  of  the  industry’s  growth  is  now  concentrated  in  Asia.  We  believe  we  are  well  positioned  to 
capitalize on this growth, both with our brand and our resources, and we are actively expanding
our presence within the region.

We are growing our technology infrastructure in Asia with the design and construction of a new, state
of the art technology center adjacent to our existing manufacturing facility in Geino, Japan. This 
technology center is our first research and development facility to be located outside of the United States, and it
represents an important step in establishing full technology development capability within the Asia Pacific region to
support our customers. This investment, in conjunction with our deployment of additional executive, senior management, 
and technical and commercial talent and attention in Asia, underscores the importance of the Asia Pacific market to our company. 

OPPORTUNITIES WITHIN A DYNAMIC INDUSTRY
We expect continued rapid technical advancement and change within the semiconductor industry, and we anticipate that this dynamic environment will provide
many continuing challenges and opportunities for CMP suppliers. The emerging digital technologies of today are enabling a new era in which computing, content
and connectivity are becoming all pervasive. Advancement in the technologies that underpin this connectivity, including those for memory, broadband, networking
and mobile applications, fueled by escalating demand for consumer devices, appear to be driving the next wave of growth in the semiconductor industry.

We believe that this new emphasis on connectivity and consumer devices will drive significant development of new CMP solutions, paralleling the traditional
emphasis on CMP slurries for microprocessors. As the semiconductor industry advances the development and mass production of devices with feature sizes 
of 90 nanometers and smaller, we expect that the associated technical and materials challenges will continue to escalate and drive the need for 
innovative new CMP materials and process technologies. 

WELL POSITIONED FOR THE FUTURE
From our perspective, growth associated with the rapid incorporation of CMP technology, along with the challenges and rewards associated with meeting future
requirements for CMP provide an attractive outlook for the CMP industry, which naturally has attracted competitors. However, we believe that Cabot Microelectronics
is uniquely positioned for continued success and leadership. No other CMP slurry provider has our track record of developing products to meet the demands of
advanced technology, improving existing technology and successfully meeting the ever more stringent product performance requirements of the IC industry
through sustained high volume manufacturing. Further, in our view our technical capabilities and the quality and scale of our global supply chain and service 
infrastructure are unmatched in our industry. We believe we are the only CMP slurry supplier in the world today that offers and supports a full line of CMP 
products for all major applications and serves a broad range of customers globally, while successfully providing the attendant technical support.

Although there are indications that 2005 will be a year of moderating growth in semiconductor industry revenue and possibly even a contraction, we believe that 
we are well positioned for continued success in CMP slurries. We are excited about our opportunities, and are eager to tackle the challenges of the future.

In closing, I want to offer my thanks to our shareholders for their continued commitment and confidence in our company. My leadership team and I are your 
stewards and we take very seriously our responsibilities to you. I also thank our customers for their support and for their business. Finally, and most importantly,
I thank all of our employees for their dedication and hard work without which our company could not be successful. 

WILLIAM P. NOGLOWS
Chairman, President and Chief Executive Officer

PAGE 3

TECHNOLOGY LEADERSHIP

As semiconductor technology has become more advanced and device
feature sizes continue to shrink, CMP solutions have become
increasingly complex. Leading edge technologies now often require
customization by customer, tool set and process integration approach.
We believe that this trend toward greater customization will continue
into the 65 and 45 nanometer technologies and beyond. To enable future
success, we intend to fully leverage our technology infrastructure and
resources, as well as our extensive capabilities in research and 
development to develop the CMP solutions of tomorrow.

Cabot Microelectronics has historically invested approximately 15 
percent of revenue in research and development, and more than 
30 percent of our workforce is dedicated to R & D. These world-class 
scientists and engineers are organized into teams that are focused 
on R & D for product development, process enhancement and 
enabling technologies. 

We also look outside our company for opportunities to further our 
technology leadership. Our recently announced strategic alliance with
NanoProducts Corporation, a privately-held technology leader in nano-
scale particles, is one example of this strategy. Nano-particles can be
customized and highly engineered to deliver unique performance 
attributes and we believe that through collaboration with companies
like NanoProducts Corporation we may be able to develop a range of
custom abrasive particles that will enable innovative CMP solutions to
meet the needs of our customers’ future generation technologies.

PAGE 4

More than 30% of our workforce is 
dedicated to R&D, representing a team  
of world-class scientists and engineers.

We believe Cabot Microelectronics is the leader in all major application areas for CMP slurries, including
copper, tungsten, and oxide, and our broad product portfolio includes solutions for all technology nodes.
Our products are designed to enable optimal removal rates and cleanability, outstanding surface finish,
proper selectivity for maximum planarization, and decreased dishing, erosion and defects.

Beyond the IC CMP industry, we have successfully translated our capabilities and technology in fine finish
polishing into the data storage industry. Our highly engineered solutions play a critical role in enabling the
production of rigid disks and magnetic heads, two critical components of hard disk drives. In the future, 
we plan to seek additional opportunities to grow our business by leveraging our capabilities into other
demanding applications that require engineered surface finishes.

PAGE 5

OPERATIONS EXCELLENCE

Cabot Microelectronics recognizes that as feature sizes continue to shrink, the quality and
consistency requirements for our products become increasingly stringent. Our operations
excellence initiative is focused on improving quality and productivity across our organization and
through our supply chain. Our goal is to identify and eliminate sources of variation in order to 
provide the highest quality products with the lowest cost of ownership to our customers, while 
optimizing the utilization of our resources and infrastructure. 

This past year we implemented a company wide Six Sigma initiative in order to more effectively 
identify and act upon improvement opportunities. Although early in the process, we are excited about
the initial results and believe this effort will help identify opportunities for cost improvement through
variability reduction  as  well  as  decrease  the  time  to  market  for  new  products  allowing  us  to 
deliver added value to our customers.

Our quality initiatives also include our suppliers’ processes. We are partnering with our suppliers and
using Six Sigma techniques to reduce variability and improve raw material quality. Our 
operations excellence initiative incorporates quality from the beginning to end of the process.

We are employing 
Six Sigma in combination 
with other quality process 
initiatives to deliver added 
value to our customers.

PAGE 6

GETTING CLOSER TO OUR CUSTOMERS

As the semiconductor industry evolves, the 
relationship between customer and supplier has
become even more important than in the past. We
partner with our customers to anticipate industry
changes and develop new solutions for advanced
polishing processes.

We  believe  Cabot  Microelectronics  has  world-class
technical and applications support teams that are
unrivaled in the industry – across Asia, Europe 
and the U.S. Our financial strength and leadership
in  CMP  technology  enable  us  to  attract  and
retain the world’s best scientists and engineers
to develop advanced technological applications
for our customers. 

PAGE 7

EXPANSION IN ASIA

Cabot Microelectronics has a strong presence and brand
in Asia, where the semiconductor industry continues to
grow, and where production and technology advancements
outpace all other regions. Nearly 65 percent of our revenue
in fiscal 2004 came from the Asia Pacific region.  

Our manufacturing plant in Geino, Japan has more than
120 employees and is our highest volume plant globally,
with expansion efforts underway to further increase production. Expanding our existing capacity in
Japan, combined with output from our other manufacturing facilities, will help us maintain supply 
flexibility and efficiency to respond to the growing Asia Pacific demand. 

We are also expanding our footprint in Asia by building a new Asia Pacific Technology Center 
adjacent to our existing manufacturing site in Japan. This technology center will include a 
product development facility, along with a polishing and metrology clean room. The center 
is scheduled for start-up in 2005 and will allow us to develop and test new formulations and 
product platforms to support our customers worldwide.

We also have sales and technical support staff in Japan, Taiwan, Korea, Singapore, and China, as 
well as analytical capabilities in Taiwan to serve and support our industry-leading customers 
throughout Asia. 

In addition, we have put in place a focused management team for China and Southeast Asia to 
support market development in this significant region.

Nearly 65% of our revenue in fiscal 2004 
came from the Asia Pacific region.

PAGE 8

LEADERSHIP TEAM

William P. Noglows
Chairman of the Board,
President and
Chief Executive Officer

William S. Johnson
Vice President, Chief
Financial Officer and
Treasurer

Clifford R. Spiro
Vice President of Research 
and Development

Julie A. Hensel
Director of Global Quality

Daniel S. Wobby
Vice President of Greater
China and Southeast Asia

Victoria J. Brush
Vice President of 
Human Resources

Adam F. Weisman
Vice President of Operations

Stephen R. Smith
Vice President of
Marketing and Sales

Daniel J. Pike
Vice President of 
Corporate Development

James DeHoniesto
Chief Information Officer

Hiroyuki Nishiya
Vice President of 
Northeast Asia

Jean Pol Delrue
Vice President of European
Business Region

H. Carol Bernstein
Vice President, Secretary 
and General Counsel

CORPORATE INFORMATION

CORPORATE HEADQUARTERS

Board of Directors

William P. Noglows
Chairman
President and Chief Executive Officer,
Cabot Microelectronics Corporation

Juan Enriquez-Cabot
Director
Chairman and Chief Executive Officer, 
Biotechonomy LLC

John P. Frazee, Jr.
Director
Former Chairman and Chief Executive Officer,
Centel Corporation

H. Laurance Fuller
Director
Former Co-Chairman, BP Amoco PLC

Ronald L. Skates
Director
Former President and Chief Executive Officer,
Data General Corporation

Steven V. Wilkinson
Director
Former Partner, Arthur Andersen LLP

Cabot Microelectronics Corporation
870 N. Commons Drive
Aurora, IL 60504
(630) 375-6631

Investor Information

Investor inquiries are welcome, and individuals are invited to
contact our offices by mail at the address above, by telephone
at (630) 499-2600 or through our website at
www.cabotcmp.com.

Stock Information

Cabot Microelectronics is traded on NASDAQ® under the 
symbol CCMP.

Stock Transfer Agent and Registrar

EquiServe Trust Company, N.A.
P.O. Box 43010
Providence, RI 02940-3010
(781) 575-3400
www.equiserve.com

Independent Auditors

PricewaterhouseCoopers LLP
Chicago, IL 

Shareholder Meeting

The Annual Meeting of Shareholders will be held at 8 a.m. 
on March 8, 2005, at Cabot Microelectronics Corporation, 
870 N. Commons Drive, Aurora, IL.

Form 10-K

A copy of the Cabot Microelectronics Annual Report on Form
10-K for the fiscal year ended September 30, 2004 filed with
the Securities and Exchange Commission is enclosed and also
available without charge at our website, www.cabotcmp.com.

PAGE 9

870 N. Commons Drive
Aurora, IL 60504
TEL: (630) 375-6631
TOLL FREE: (800) 811-2756
FAX: (630) 499-2666
www.cabotcmp.com

1995–AR-05